END POINT DETECTING SYSTEM OF PHOTOMASK AND DETECTING METHOD THEREOF

摘要

PURPOSE: A system and a method for detecting the etching termination point of a photo mask are provided to accurately detect the etching termination point of the photo mask by detecting the carbide gas of a photo-sensitive film pattern containing carbon. CONSTITUTION: A processing chamber(100) arranges a space implementing a plasma dry ditching process. A gas amount detecting unit(200) detects the amount of gas generated from an etching object. A controlling unit(300) controls an etching termination point based on the detected amount of the gas. The controlling unit includes a controlling part(210) and a display part(220). The controlling part controls an etching process according to the detection signal of the gas amount detecting unit. The display part displays a detection signal in real time.