| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a charged particle beam plotting device and a charged particle beam plotting method obtaining high plotting position accuracy by accurately measuring a stage position. <P>SOLUTION: A position signal by a first stage position measuring means is obtained in S101, and a frequency analysis of this signal is made in S103. A position signal by a second stage position measuring means is obtained in S102, and a frequency analysis of this signal is made in S104. In S105, the results of S103 and S104 are compared to specify a vibration component derived from the first position measuring means. In S106, a signal of reverse phase to the vibration component predetermined in S105 is generated. In S107, the signal generated in S105 is added to the position signal obtained in S101. A correction signal is transmitted to a servo control section and a deflection control section to control a stage position and an electron beam position. <P>COPYRIGHT: (C)2011,JPO&INPIT |
