| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure system which can prolong the life of a photomask. <P>SOLUTION: An exposure apparatus 101 is configured to irradiate a mask with illumination light and to irradiate a wafer with light from the mask irradiated with the illumination light. The exposure apparatus includes an information acquisition unit 131 configured to acquire use history information that is information regarding a use history of the mask, a condition derivation unit 132 configured to derive a setting value or a change amount of an optical setting condition of the exposure apparatus, based on the acquired use history information and correspondence information that indicates a correspondence between the use history of the mask and the optical setting condition of the exposure apparatus, and an exposure unit 133 configured to set the optical setting condition of the exposure apparatus to an optical setting condition specified by the derived setting value or change amount, and to expose the wafer under the set optical setting condition. <P>COPYRIGHT: (C)2011,JPO&INPIT |
