发明名称 COMBINED CMP AND ETCH PLANARIZATION
摘要 A magnetic device having a magnetic feature, the magnetic feature including magnetic portions, a stop layer portion on each magnetic portion, and a region of non-magnetic material adjacent to the magnetic portions and the stop layer portions, where the stop layer portions define planar upper boundaries for the magnetic portions and an endpoint in planarization of the magnetic feature.
申请公布号 US2011038082(A1) 申请公布日期 2011.02.17
申请号 US20090540185 申请日期 2009.08.12
申请人 SEAGATE TECHNOLOGY LLC 发明人 FAN ZHAOHUI;KUO DAVID S.;LEE KIM YANG
分类号 G11B5/74;B05D5/12 主分类号 G11B5/74
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