ELECTRONIC DEVICE MANUFACTURE

摘要

PURPOSE: A method for manufacturing an electronic device is provided to manufacture an electronic device with a low dielectric constant material by using a multi layer of a backup porous dielectric material to form a pore after an aperture is etched and metal is filled. CONSTITUTION: A bottom dielectric layer(105) includes an etching stop unit(110) used as a copper diffusion barrier and a metal stud(100). A first backup-porous organic poly silica dielectric layer(120) is formed on the bottom dielectric layer. An etching stop layer(125) is formed on the first backup-porous organic poly silica dielectric layer. A second backup-porous dielectric layer(130) is formed on the etching stop layer. A spin-on backup-porous etching stop layer(135) is formed on the second backup-porous dielectric layer.