发明名称 Memory Formed By Using Defects
摘要 A non-volatile memory is provided. The non-volatile memory comprises at least a silicon-on-insulator transistor including a substrate; an insulating layer disposed on the substrate; an active region disposed on the insulating layer; and an energy barrier device disposed in the active region and outputting a relatively small current when the non-volatile memory is read.
申请公布号 US2011032765(A1) 申请公布日期 2011.02.10
申请号 US20090617516 申请日期 2009.11.12
申请人 NATIONAL TAIWAN UNIVERSITY 发明人 CHEN YEN-TING;HUANG CHING-FANG;SUN HUNG-CHANG;LIU CHEE WEE
分类号 G11C16/04;G11C11/34;H01L21/66 主分类号 G11C16/04
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