发明名称 SURFACE ANALYZING APPARATUS
摘要 PURPOSE:To facilitate the preparation of a specimen and to observe the surface efficiently by providing an etching device for a scanning type electronic microscope as a unitary body. CONSTITUTION:A specimen 1 is mounted on a specimen stage 10. An electron beam A from an electron gun is focused through an objective lens and projected on the surface of the specimen 1. Secondary electrons generated from the surface of the specimen 1 are detected with a detector 3. An image is formed on a CRT based on the secondary electrons. Thus, the surface of the specimen is observed. When the surface of the specimen is etched, a gate valve 6 is opened, and the specimen 1 is moved into an etching chamber 5 wherein a vacuum state is maintained beforehand. Then, the gate valve 6 is closed, and Freon gas is made to flow into the etching chamber 3. At the same time, high frequency power is applied, and the surface of the specimen 1 is etched. When the etching is finished, the flow of the Freon gas is stopped, and remaining gas is exhausted through an exhaust port 9. The gate valve 6 is opened, and the specimen 1 is returned into a specimen chamber 4. Then the surface is observed.
申请公布号 JPH0235344(A) 申请公布日期 1990.02.05
申请号 JP19880186110 申请日期 1988.07.25
申请人 MITSUBISHI ELECTRIC CORP 发明人 IMAI YUKARI
分类号 G01N23/22 主分类号 G01N23/22
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