A lithographic apparatus, a method of controlling the apparatus and a method of manufacturing a device using a lithographic apparatus

摘要

An immersion lithographic apparatus is disclosed that includes a substrate table configured to support a substrate, a projection system configured to direct a patterned beam of radiation onto a substrate, a liquid handling system configured to supply and confine immersion liquid to a space defined between a projection system and a substrate, or substrate table, or both, and a controller to control speed of motion of the substrate table relative to the liquid handling system during movement of the substrate table through a path under the liquid handling system based on a distance between turns in the path.