| 摘要 |
<p>The method for applying a precious metal thin film on a substrate comprises producing a conductive and doped base coating of a precious metal on the substrate (S100), strengthening the base coating (S104, S106) to a desired total thickness of the thin film by galvanic deposition of the precious metal on the base coating, and carrying out a temperature treatment (S116) of the produced thin film, and structuring the thin film. The base coating is produced by vapor deposition, sputtering or screen printing. The base coating has a thickness of 0.05-0.1 mu m. The method for applying a precious metal thin film on a substrate, comprises producing a conductive and doped base coating of a precious metal on the substrate (S102), strengthening the base coating (S104, S106) to a desired total thickness of the thin film by galvanic deposition of the precious metal on the base coating, and carrying out a temperature treatment (S116) of the produced thin film, and structuring the thin film. The base coating is produced by vapor deposition, sputtering or screen printing. The base coating has a thickness of 0.05-0.1 mu m. The strengthening is carried out by strengthening (S108, S110) the layer up to a pre-determined thickness of the precious metal and carrying out a temperature treatment. The strengthening and the temperature treatment are repeated for reaching the total thickness. The pre-determined thickness is 0.4-0.6 mu m and the temperature treatment is carried out for a period of 10-60 minutes at 600-900[deg] C. The total thickness of the thin film is 0.5-1.5 mu m. The thin film is a doped thin film and/or a precious metal electrolyte modified corresponding to the desirable doping of the thin film is used. The doping material is platinum or rhodium. The platinum electrolyte is acid electrolytes such as hexa-chloroplatinic (IV) acid or platinum (IV) chloride or alkaline electrolytes such as diammine dinitrito-platinum (II) or tetrammine-platinum (II) sulfate. The coating parameters are adjusted for hexa-chloroplatinic (IV) acid and/or tetrammine-platinum (II) sulfate, where the coating parameters are electrolyte, electrolyte concentration, temperature, current density and pH. The hexa-chloroplatinic (IV) acid has a concentration of 15-25 g/l, temperature of 45-70[deg] C, current density of 2.5-3.5 A/dm 2>and pH of salt acid solution (10-390 ml/l) and the tetrammine-platinum (II) sulfate has a concentration of 6 g/l, temperature of 91-93[deg] C, current density of 0.5-1 A/dm 2>and pH of 10.2-10.6. The substrate comprises a ceramic substrate or a glass substrate. The ceramic substrate is aluminum oxide substrate or barium titanate ceramic substrate. An independent claim is included for producing a temperature sensor.</p> |
