发明名称 SHARED GATE FOR CONVENTIONAL PLANAR DEVICE AND HORIZONTAL CNT
摘要 A semiconductor structure in which a planar semiconductor device and a horizontal carbon nanotube transistor have a shared gate and a method of fabricating the same are provided in the present application. The hybrid semiconductor structure includes at least one horizontal carbon nanotube transistor and at least one planar semiconductor device, in which the at least one horizontal carbon nanotube transistor and the at least one planar semiconductor device have a shared gate and the at least one horizontal carbon nanotube transistor is located above a gate of the at least one planar semiconductor device.
申请公布号 US2011027951(A1) 申请公布日期 2011.02.03
申请号 US20100902944 申请日期 2010.10.12
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 FURUKAWA TOSHIHARU;HAKEY MARK C.;HOLMES STEVEN J.;HORAK DAVID V.;KOBURGER, III CHARLES W.;MASTERS MARK E.
分类号 H01L21/8234 主分类号 H01L21/8234
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