VACUUM GAUGE OF PROCESS CHAMBER

摘要

PURPOSE: A vacuum gauge of a process chamber is provided to protect a wafer from the pollution by preventing thermion, a second thermion, and an electromagnetic wave generated within a vacuum gauge. CONSTITUTION: A vacuum gauge of a process chamber relates to a vacuum gauge of a process chamber having a filter at an entrance of a vacuum gauge. The vacuum gauge comprises a filament(10), a grid(12), and a collector(14). A connection hole(22) is disposed between the vacuum gauge and the process chamber. In the connection hole, a circular cone shaped auxiliary connection hole(16) comprising a circular filter(18) and a plurality of polarizing filter(20) is disposed. A control unit comprises a power amplifier(24) and a measuring device(25).