发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p>An object is to reduce the manufacturing cost of a semiconductor device. An object is to improve the aperture ratio of a semiconductor device. An object is to make a display portion of a semiconductor device display a higher-definition image. An object is to provide a semiconductor device which can be operated at high speed. The semiconductor device includes a driver circuit portion and a display portion over one substrate. The driver circuit portion includes: a driver circuit TFT in which source and drain electrodes are formed using a metal and a channel layer is formed using an oxide semiconductor; and a driver circuit wiring formed using a metal. The display portion includes: a pixel TFT in which source and drain electrodes are formed using an oxide conductor and a semiconductor layer is formed using an oxide semiconductor; and a display wiring formed using an oxide conductor.</p>
申请公布号 WO2011010544(A1) 申请公布日期 2011.01.27
申请号 WO2010JP61303 申请日期 2010.06.25
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD.;YAMAZAKI, SHUNPEI;SAKATA, JUNICHIRO;MIYAKE, HIROYUKI;KUWABARA, HIDEAKI 发明人 YAMAZAKI, SHUNPEI;SAKATA, JUNICHIRO;MIYAKE, HIROYUKI;KUWABARA, HIDEAKI
分类号 H01L29/786;G02F1/1368;H01L21/28;H01L29/417 主分类号 H01L29/786
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