发明名称 Stage apparatus and coating treatment device
摘要 A stage apparatus includes a stage over which a substrate is to be transferred, and a levitation mechanism which levitates the substrate over the stage. The stage includes a plurality of gas spray ports (16a) to spray a gas for levitating the substrate (G), and a plurality of suction ports (16b) to take in air sprayed from the gas spray ports (16a). The plurality of gas spray ports (16a) and the plurality of suction ports (16b) are set not to be arranged on straight lines parallel to a substrate transfer direction in a predetermined length along the substrate transfer direction.
申请公布号 US7874261(B2) 申请公布日期 2011.01.25
申请号 US20060816784 申请日期 2006.02.15
申请人 TOKYO ELECTRON LIMITED 发明人 YAMASAKI TSUYOSHI;SAKAI MASATAKA
分类号 B05C13/00 主分类号 B05C13/00
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