| 摘要 |
An exposure apparatus including a projection optical system and configured to expose a substrate to light via the projection optical system includes a support configured to support the projection optical system, an object supported by the support and movable relative the support, an actuator configured to drive the object, a detector configured to detect a relative position between the object and the support, and a controller configured to perform a control of the actuator based on an output of the detector to cause the object to follow the support. The controller is configured to perform an estimation of a vibration of the support based on an output of the detector in parallel with the control to cause the object to follow the support.
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