发明名称 Polishing pad
摘要 A polishing pad provides excellent optical detection accuracy properties over a broad wavelength range (particularly at the short-wavelength side) and is capable of preventing a slurry from leaking from the boundary between a polishing region and a light-transmitting region. The polishing pad includes at least a transparent support film laminated on one side of a polishing layer including a polishing region and a light-transmitting region; the light transmittance of an optical detection region containing at least the light-transmitting region and the transparent support film is 40% or more in the overall range of wavelengths of 300 to 400 nm.
申请公布号 US7874894(B2) 申请公布日期 2011.01.25
申请号 US20070294402 申请日期 2007.05.15
申请人 TOYO TIRE & RUBBER CO., LTD. 发明人 FUKUDA TAKESHI;HIROSE JUNJI;NAKAI YOSHIYUKI;KIMURA TSUYOSHI
分类号 B24B37/013;B24B37/20;B32B5/18;B32B27/40;H01L21/304 主分类号 B24B37/013
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