发明名称 |
MANUFACTURING APPARATUS AND METHOD FOR SEMICONDUCTOR DEVICE |
摘要 |
There is provided an apparatus for manufacturing a semiconductor device including a chamber in which a wafer is loaded; a gas supply mechanism for supplying process gas into the chamber; a gas discharge mechanism for discharging gas from the chamber; a heater having a slit and for heating the wafer to a predetermined temperature; a push-up base on which the wafer is mounted in an lifted state and housed in the slit in a lower state; a vertical rotation drive control mechanism for moving the push-up base up/down and rotating the push-up base in an lifted state; and a rotating member for rotating the wafer in a predetermined position and a rotation drive control mechanism connected to the rotating member.
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申请公布号 |
US2011014789(A1) |
申请公布日期 |
2011.01.20 |
申请号 |
US20100836189 |
申请日期 |
2010.07.14 |
申请人 |
SUZUKI KUNIHIKO;ITO HIDEKI |
发明人 |
SUZUKI KUNIHIKO;ITO HIDEKI |
分类号 |
H01L21/285;C23C16/52 |
主分类号 |
H01L21/285 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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