MICROWAVE PLASMA PROCESSING DEVICE

摘要

To provide a microwave plasma-treating apparatus which is capable of generating plasma having a high degree of uniformity of density and a high density for executing large-quantity and high-speed processing, capable of generating plasma of a large area, and capable of preventing dielectric windows from being thermally broken despite the apparatus being operated with large electric power for extended periods of time. The microwave plasma-treating apparatus includes a waveguide arranged to feed microwave electric power, a plurality of microwave coupling holes formed in the waveguide in the axial direction thereof, a dielectric member of a piece of plate capable of transmitting microwaves arranged in the waveguide in the axial direction thereof under the microwave coupling holes, a gap formed between the plurality of microwave coupling holes and the dielectric member, and a cooling member for cooling the dielectric member. Desirably, the microwave coupling holes have an annular shape.