发明名称 |
FILM DEPOSITION APPARATUS, SUBSTRATE PROCESSING APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER READABLE STORAGE MEDIUM |
摘要 |
PURPOSE: A thin film deposition apparatus, a substrate processing apparatus, a thin film deposition method, and a computer readable storage media are provided to improve the yield of a thin film deposition process by alternately supplying at least two source gases to a substrate. CONSTITUTION: A turn-table(2) is installed in a vacuum chamber(1) A substrate receiving part is installed in order to load substrate on the turn-table. A core part(21) is fixed to the upper side of a turning shaft(22) expanded to a vertical direction. The turning shaft and a driving unit(23) are arranged in a case main body(20). An exhaust opening is installed to the vacuum chamber in order to exhaust gas in the vacuum chamber.
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申请公布号 |
KR20110004345(A) |
申请公布日期 |
2011.01.13 |
申请号 |
KR20100132461 |
申请日期 |
2010.12.22 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KATOH HITOSHI;HONMA MANABU;ANTHONY DIP |
分类号 |
H01L21/205 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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