发明名称 |
Apparatus for detecting a fine geometry on a surface of a sample and method of manufacturing a semiconductor device |
摘要 |
A detecting apparatus for detecting a fine geometry on a surface of a sample, wherein an irradiation beam is irradiated against the sample placed in a different environment different from an atmosphere and a secondary radiation emanated from the sample is detected by a sensor, and wherein the sensor is disposed at an inside of the different environment, a processing device to process detection signals from the sensor is disposed at an outside of the different environment, and a transmission means transmits detection signals from the sensor to the processing device. <IMAGE> |
申请公布号 |
EP1291900(B1) |
申请公布日期 |
2011.01.12 |
申请号 |
EP20020020243 |
申请日期 |
2002.09.10 |
申请人 |
EBARA CORPORATION;KABUSHIKI KAISHA TOSHIBA |
发明人 |
HATAKEYAMA, MASAHIRO;MURAKAMI, TAKESHI;SATAKE, TOHRU;NOJI, NOBUHARU;NAGAHAMA, ICHIROTA;YAMAZAKI, YUICHIRO |
分类号 |
H01J37/26;H01L21/66;G01B15/00;G01N21/88;G01N21/95;G03F1/00;G06T7/00;G21K7/00;H01J37/16;H01J37/244;H01J37/29 |
主分类号 |
H01J37/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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