发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION |
摘要 |
<p>A radiation-sensitive resin composition comprising: (A) a resin containing an acid-labile group; (B) a radiation-sensitive acid generator; and (C) an acid diffusion regulator comprising (C1) a compound represented by general formula (1-1) (wherein R1 and R2 independently represent a hydrogen atom, or the like; and Rp represents an acid-labile group) and (C2) a compound represented by general formula (1-2) (wherein R3 represents a hydrogen atom, or the like; and R4 to R6 independently represent a hydrogen atom, or the like) or general formula (1-3) (wherein R3 represents a hydrogen atom, or the like; Rq represents a single bond, or the like; and R5 and R6 independently represent a hydrogen atom, or the like).</p> |
申请公布号 |
WO2011002081(A1) |
申请公布日期 |
2011.01.06 |
申请号 |
WO2010JP61328 |
申请日期 |
2010.07.02 |
申请人 |
JSR CORPORATION;NAKAGAWA, HIROKI;NARUOKA, TAKEHIKO;NAKAMURA, SHINICHI;KASAHARA, KAZUKI |
发明人 |
NAKAGAWA, HIROKI;NARUOKA, TAKEHIKO;NAKAMURA, SHINICHI;KASAHARA, KAZUKI |
分类号 |
G03F7/004;G03F7/039;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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