发明名称 |
COMPOSITION FOR WATER-SOLUBLECOATING LAYER |
摘要 |
PURPOSE: A composition for soluble coating film is provided to improve line edge roughness of photoresist pattern and line width roughness. CONSTITUTION: A composition for soluble coating film contains 1-30 weight% of soluble polymer, 0.1-300 weight parts of acid compound selected from the group consisting of organic acid, inorganic acid and mixture thereof based on 100.0 weight parts of soluble polymer, 0.1-50 weight parts of organic base based on 100.0 weight parts of soluble polymer, and remaining amount of solvent. |
申请公布号 |
KR20100138020(A) |
申请公布日期 |
2010.12.31 |
申请号 |
KR20090056352 |
申请日期 |
2009.06.24 |
申请人 |
DONGJIN SEMICHEM CO., LTD. |
发明人 |
LEE, JUNG YOUL;JANG, EU JEAN;LEE, JAE WOO;KIM, JAE HYUN |
分类号 |
G03F7/26 |
主分类号 |
G03F7/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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