发明名称 VACUUM PROCESSING DEVICE, MAINTENANCE METHOD FOR VACUUM PROCESSING DEVICE, AND VACUUM PROCESSING FACTORY
摘要 A vacuum processing device includes a first processing chamber for housing a workpiece and performing vacuum processing on the workpiece, an evacuatable second processing chamber for housing a workpiece to be vacuum-processed and a workpiece having been vacuum-processed, a gate unit provided between the first and second processing chambers in such a manner that the gate unit is attachable to and detachable from the first processing chamber, a transport device for loading the workpiece to be vacuum-processed, from a loading unit to a vacuum processing unit through the gate unit and unloading the workpiece having been vacuum-processed, from the vacuum processing unit to an unloading unit through the gate unit and a movement mechanism for separating the first and second processing chambers from each other.
申请公布号 US2010329828(A1) 申请公布日期 2010.12.30
申请号 US20090918674 申请日期 2009.01.29
申请人 KISIMOTO KATSUSHI;FUKUOKA YUSUKE 发明人 KISIMOTO KATSUSHI;FUKUOKA YUSUKE
分类号 H01L21/677 主分类号 H01L21/677
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