发明名称 LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE MEDIUM
摘要 A liquid processing apparatus processes an object to be processed W including a body part Wi and a plurality of projecting-shape parts Wm disposed on the body part Wi, with an inorganic film and a different film being laminated to each other. The liquid processing apparatus comprises: a support part 50 configured to support the body part Wi; a hydrophobic-liquid supply mechanism 30 configured to supply a hydrophobic liquid to the object to be processed W; and a rinse-liquid supply part 22 configured to supply a rinse liquid to the object to be processed W to which the hydrophobic liquid has been supplied. The hydrophobic-liquid supply mechanism 30 includes: a first hydrophobic-liquid supply part 32 configured to supply a first hydrophobic liquid for making hydrophobic the inorganic film; and a second hydrophobic-liquid supply part 37 configured to supply a second hydrophobic liquid for making hydrophobic the different film.
申请公布号 US2010330283(A1) 申请公布日期 2010.12.30
申请号 US20100784744 申请日期 2010.05.21
申请人 TOKYO ELECTRON LIMITED 发明人 NAKAMORI MITSUNORI;FUJITA AKIRA;TOSHIMA TAKAYUKI
分类号 B05D3/10;B05C11/00;B05C13/00 主分类号 B05D3/10
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