| 摘要 |
PURPOSE: A shower head and a substrate processing apparatus using the same are provided to efficiently eliminate particles by spraying a gap between a shower head and a supporting ring. CONSTITUTION: An inlet(34) is formed on an upper plate(31) in order to allow a gas to flow. A ring-shaped cleaning gas supplying path(72) is formed along the peripheral direction of a sidewall part. An introducing hole(71) induces a cleaning gas to the cleaning gas supplying path. A chamber includes a space in order to perform a process with respect to a substrate. A susceptor is installed in the space of the chamber in order to support the substrate.
|
