| 摘要 |
PROBLEM TO BE SOLVED: To surely implement a measurement regardless of the quality of a characteristic of a to-be-inspected object (the degree of an aberration and a shape error). SOLUTION: An embodiment for explaining an apparatus for measurement wavefront shape includes: a microlens array (16) for individually collecting partial light fluxes of a to-be-inspected light flux through the to-be-inspected object (10); a detection means (17) for obtaining array data of light collection points of the partial light fluxes by the microlens array; a wavefront deformation means (15) for superimposing a predetermined shape component on a wavefront of the to-be-inspected light flux directed to the microlens array; and a shape adjustment means (18) for adjusting the shape component to be superimposed on the wavefront by the wavefront deformation means. COPYRIGHT: (C)2011,JPO&INPIT |
