| 摘要 |
PROBLEM TO BE SOLVED: To improve the throughput of a substrate-sticking apparatus. SOLUTION: A substrate-processing apparatus includes a hermetic chamber for housing a substrate so as to be hermetically separated from the surrounding; a jet portion for jetting a gas against the inner wall of the hermetic chamber; a discharging portion for discharging a gas from the inside of the hermetic chamber; and a control portion for executing the operation of simultaneously causing the jet portion to jet the gas and a discharging portion to discharge the gas and the operation of discharging the gas, after the operation. The control portion may make the jet portion jet the gas against the inner wall, and then make the gas jet along the inner wall. COPYRIGHT: (C)2011,JPO&INPIT
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