DEVICE AND METHOD FOR SIMULTANEOUSLY MICROSTRUCTURING AND DOPING SEMICONDUCTOR SUBSTRATES

摘要

The invention relates to a device and to a method for simultaneously microstructuring and doping semiconductor substrates with boron, wherein the semiconductor substrate is treated by means of a laser beam coupled into a fluid stream, wherein the fluid stream comprises at least one boron compound. The method according to the invention is used in the area of solar cell technology and in other areas of semiconductor technology, in which a locally limited boron doping is significant.