发明名称 |
REDUCED PROCESS SENSITIVITY OF ELECTRODE-SEMICONDUCTOR RECTIFIERS |
摘要 |
PURPOSE: An electrode-semiconductor rectifier is provided to improve the electric field properties of a semiconductor element by non-uniformly forming the dopant concentration of a mesa region of the semiconductor element. CONSTITUTION: An n-type semiconductor layer(110) is formed on a substrate(105). A trench electrode(130) forms from the upper side of the n-type semiconductor layer and into the n-type semiconductor layer. The trench electrode includes a conductive electrode(132) and an oxide layer(134). A plurality of mesa regions(120) is formed between trench electrodes. A region(150) with an n-type dopant concentration is formed on the upper side of the mesa regions. |
申请公布号 |
KR20100133868(A) |
申请公布日期 |
2010.12.22 |
申请号 |
KR20090072142 |
申请日期 |
2009.08.05 |
申请人 |
FAIRCHILD SEMICONDUCTOR CORPORATION |
发明人 |
YEDINAK JOSEPH A.;RINEHIMER MARK L.;GREBS THOMAS E.;BENJAMIN JOHN L. |
分类号 |
H01L29/872 |
主分类号 |
H01L29/872 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|