SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

摘要

PURPOSE: A salt which is used in a photoacid generator and a photoresist composition containing the same with excellent decomposition ability and LER(line edge roughness) are provided. CONSTITUTION: A salt which is used in a photoacid generator has a group of chemical formula I. A photoresist composition contains the salt and resin containing a structure unit which is soluble in alkali solution by acidic action. The photoresist composition further contains basic compound. A method for preparing the photoresist pattern comprises: a step of applying the photoresist composition on a substrate; a step of drying to form photoresist film; a step of exposing the photoresist film to radiation; a step of baking the photoresist film; and a step of developing the photoreist film using an alkaline developer.