EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an exposure apparatus and an exposure method which improve productivity in semiconductor manufacturing process by preventing positioning errors between exposure apparatus different in positioning references to reduce the down time of errors of pre-alignment.

SOLUTION: The exposure apparatus includes a detection part for detecting the outer periphery position of a substrate, a calculation part for calculating data about the outer periphery shape of the substrate on the basis of the output of the detection part, an adjustment part for adjusting the position of the substrate on the basis of the output of the calculation part, and a transporting part for transporting the substrate subjected to position adjustment in the adjustment part onto a stage. The exposure apparatus furthermore includes a mark detection part for detecting the position of a mark formed on the substrate on the stage and a changing part for changing a calculation condition or a calculation method in the calculation part on the basis of the output of the mark detection part.

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