发明名称 |
METHODS FOR MANUFACTURING A CONTACT GRID ON A PHOTOVOLTAIC CELL |
摘要 |
Processes for fabricating a contact grid for a photovoltaic cell generally includes providing a photovoltaic cell having an antireflective coating disposed on a sun facing side, the photovoltaic cell comprising a silicon substrate having a p-n junction; soft stamping a pattern of a UV sensitive photoresist and/or polymer onto the antireflective coating; exposing the UV sensitive photoresist and/or polymer to ultraviolet radiation to cure the UV sensitive photoresist and/or polymer; etching the pattern to form openings in the antireflective coating that define the contact grid; stripping the UV sensitive photoresist and/or polymer; and depositing a conductive metal into the openings defined by the pattern. The metal based paste can be aluminum based, which can be annealed at a relatively low temperature.
|
申请公布号 |
US2010317148(A1) |
申请公布日期 |
2010.12.16 |
申请号 |
US20100849648 |
申请日期 |
2010.08.03 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CLEVENGER LAWRENCE A.;HOVEL HAROLD J.;KRAUSE RAINER K.;PRETTYMAN KEVIN M. |
分类号 |
H01L31/18 |
主分类号 |
H01L31/18 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|