| 摘要 |
PURPOSE: A substrate processing apparatus is provided to prevent the generation of abnormal discharges by forming an infrared radiation body and a glass body in which the infrared radiation body is sealed. CONSTITUTION: A processing space(S) is arranged at the internal upper side of a processing chamber(11). A cylindrical susceptor(12) is arranged in the processing chamber. A shower head(27) is installed to the ceiling of the processing chamber in order to oppose the susceptor. A focus ring(24) is arranged on the external upper circumference of the susceptor. A ring shaped heater(26) is arranged around the focus ring. |
