APPARATUS FOR THIN LAYER DEPOSITION AND METHOD OF MANUFACTURING APPARATUS FOR THIN LAYER DEPOSITION

摘要

PURPOSE: A thin-film depositing device and a manufacturing method thereof are provided to prevent the collision between depositing materials by maintaining a high vacuum state and to ensure the linearity of the depositing material. CONSTITUTION: A manufacturing method of a thin-film depositing device comprises following steps. In order that given tensile force is applied to a second nozzle(150), a second nozzle frame(155) is connected to the second nozzle. A thin-film depositing device consists of a depositing source, a first nozzle, and a second nozzle and a second nozzle frame. The first nozzle is arranged on one side of the depositing source and comprises a plurality of first slits. The second nozzle is arranged to face the depositing source and comprises a plurality of second slits. The second nozzle frame supports the second nozzle.