发明名称 WAFER CLEANING WITH IMMERSED STREAM OR SPRAY NOZZLE
摘要 Several methods of removing contaminant particles from a surface of a substrate are disclosed herein. In one embodiment, the method includes directing an incompressible fluid spray onto a surface of a substrate to remove contaminant particles from the surface. In an embodiment, the surface of the substrate and the nozzle are both immersed in an incompressible fluid. The fluid can flow across the surface of the substrate to remove the contaminant particles from the area. The fluid spray can be positioned normal to the substrate surface, or can be positioned at an angle relative to the substrate surface.
申请公布号 US2010300491(A1) 申请公布日期 2010.12.02
申请号 US20090476139 申请日期 2009.06.01
申请人 MICRON TECHNOLOGY, INC. 发明人 YATES DONALD L.
分类号 B08B3/10;B08B3/02;B08B7/00;B08B13/00 主分类号 B08B3/10
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