NOVEL SALT HAVING FLUORINE-CONTAINING CARBANION STRUCTURE, DERIVATIVE THEREOF, PHOTOACID GENERATOR, RESIST MATERIAL USING THE PHOTOACID GENERATOR, AND PATTERN FORMING METHOD

摘要

There is provided an acid having a fluorine-containing carbanion structure or a salt having a fluorine-containing carbanion structure, which is represented by the following general formula (1).
By using a photoacid generator for chemically amplified resist materials that generates this acid, it is possible to provide a photoacid generator which has a high sensitivity to the ArF excimer laser light or the like, of which acid (photo generated acid) to be generated has a sufficiently high acidity, and which has a high dissolution in resist solvent and a superior compatibility with resin, and a resist material containing such a photoacid generator.