STRIPPER COMPOSITION FOR COPPER OR COPPER ALLOY

摘要

PURPOSE: A stripper composition for copper or copper alloy is provided to be applied in a dip method and spray type stripping process and to remove a photoresist film hardened by a photolithographic process and wet etch process. CONSTITUTION: A stripper composition for copper or copper alloy comprises (A) 0.1-30 weight% tertiary cyclic amine compound represented by chemical formula 1 or 2, (B) 0.01-10 weight% additive, and (C) the balance of organic solvent. In chemical formula 1 and 2, R1-R6 are independently hydrogen, C1~C10 linear or branched alkyl group; n1 and n3 are independently an integer of 0 or 1; n2 and n4 are independently an integer of 0-4; X1 and X2 are independently S, and O or N; and Y is a hydroxy group or amino group.