| 摘要 |
PROBLEM TO BE SOLVED: To provide a polysiloxane composition for forming a film that suppresses voids inside of via on a substrate having irregular surface, and satisfies high flatness, adhesion, and solvent resistance simultaneously. SOLUTION: The polysiloxane composition includes a component (A) that is a mixture of a hydrolytic condensation product of a hydrolyzable silane represented by formula (1): R<SP>1</SP>aSiR<SP>2</SP><SB>(4-a)</SB>and a hydrolytic condensation product of a hydrolyzable silane represented by formula (2): R<SP>3</SP>bSiR<SP>4</SP><SB>(4-b)</SB>or a hydrolytic condensation product of a hydrolyzable silane represented by formula (1) and a hydrolyzable silane represented by formula (2), and a component (B) that is a silicone-based surfactant, wherein, R<SP>1</SP>is an organic group having an aryl group and bound with a silicon atom by Si-C bond, R<SP>2</SP>is alkoxy, acyloxy, or halogen, and a is an integer of 1-2 in formula (1), and R<SP>3</SP>is an organic group having a secondary or tertiary amino group, R<SP>4</SP>is alkoxy, acyloxy, or halogen, and b is an integer of 1-2 in formula (2). COPYRIGHT: (C)2011,JPO&INPIT
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