发明名称 MONOMER HAVING ELECTRON-WITHDRAWING SUBSTITUENT AND LACTONE SKELETON, POLYMERIC COMPOUND, AND PHOTORESIST COMPOSITION
摘要 Disclosed is a monomer having an electron-withdrawing substituent and a lactone skeleton, represented by following Formula (1), wherein Ra represents, e.g., a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; R1 represents, e.g., a halogen atom or an alkyl or haloalkyl group having 1 to 6 carbon atoms; “A” represents an alkylene group having 1 to 6 carbon atoms, oxygen atom, sulfur atom, or nonbonding; “m” denotes an integer of 0 to 8; Xs each represent an electron-withdrawing substituent; “n” denotes an integer of 1 to 9; and Y represents a bivalent organic group having 1 to 6 carbon atoms. The monomer is useful typically as a monomer component typically for a highly functional polymer, because, when the monomer is applied typically to a resist resin, the resin is satisfactory stable and resistant typically to chemicals, is highly soluble in organic solvents, and has improved hydrolyzability and/or solubility in water after hydrolysis.
申请公布号 US2010297555(A1) 申请公布日期 2010.11.25
申请号 US20090863924 申请日期 2009.02.03
申请人 KOYAMA HIROSHI;KITAO KYUHEI;EGUCHI AKIRA 发明人 KOYAMA HIROSHI;KITAO KYUHEI;EGUCHI AKIRA
分类号 G03F7/20;C07D307/77;C08F24/00;G03F7/004 主分类号 G03F7/20
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