发明名称 INSTALLATION AND METHOD FOR REDUCING THE CONTENT IN ELEMENTS, SUCH AS BORON, OF HALOSILANES
摘要 <p>The invention relates to a method for reducing the content in elements of the third main group of the periodic system, especially in boron- and aluminum-containing compounds of technically pure halosilanes for producing high-purity halosilanes, especially high-purity chlorosilanes. The invention further relates to an installation for carrying out said method.</p>
申请公布号 EP2252549(A2) 申请公布日期 2010.11.24
申请号 EP20080871093 申请日期 2008.11.20
申请人 EVONIK DEGUSSA GMBH 发明人 MUEH, EKKEHARD;RAULEDER, HARTWIG;SCHORK, REINHOLD
分类号 C01B33/00 主分类号 C01B33/00
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