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发明名称
METHOD AND APPARATUS FOR IMPROVING ACCURACY OF PLASMA ETCHING PROCESS
摘要
申请公布号
EP1129478(B1)
申请公布日期
2010.11.24
申请号
EP19990949629
申请日期
1999.09.24
申请人
LAM RESEARCH CORPORATION
发明人
KLIPPERT, WALTER, E., II;KADAVANICH, VIKORN, MARTIN
分类号
G01B11/02;H01L21/306;B01J19/08;B81C1/00;G01B11/06;G01B11/22;H01L21/302;H01L21/3065;H01L33/00;H05H1/00;H05H1/46
主分类号
G01B11/02
代理机构
代理人
主权项
地址
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