发明名称 Electron beam apparatus and inspection method using dual illumination beams with dynamically controllable offsets
摘要 An apparatus for generating a dual-energy electron beam. The apparatus includes a first electron beam source configured to generate a lower-energy electron beam, and a second electron beam source configured to generate a higher-energy electron beam. The apparatus further includes a combining device for forming the dual-energy electron beam by combining the lower-energy and higher-energy electron beams. In addition, a first controllable electron-beam deflector is configured to provide a controllable offset of a first area illuminated by the lower-energy electron beam in relation to an image data collection area, and a second controllable electron-beam deflector configured to provide a controllable offset of a second area illuminated by the higher-energy electron beam in relation to the image data collection area. A moving stage and a time delay integration detection system are utilized. Other embodiments, aspects and features are also disclosed.
申请公布号 US7838832(B1) 申请公布日期 2010.11.23
申请号 US20080135058 申请日期 2008.06.06
申请人 KLA-TENCOR CORPORATION 发明人 MANKOS MARIAN;SPASOV VASSIL
分类号 H01J37/26;G01N23/225 主分类号 H01J37/26
代理机构 代理人
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