发明名称 |
Magnetic enhancement for mechanical confinement of plasma |
摘要 |
A method for processing a substrate is provided. The substrate is placed in a process chamber. A gas is provided from a gas source to the process chamber. A plasma is generated from the gas in the process chamber. The gas flows through a gap adjacent to at least one confinement ring to provide physical confinement of the plasma. Magnetic confinement of the plasma is provided to enhance the physical confinement of the plasma.
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申请公布号 |
US7838086(B2) |
申请公布日期 |
2010.11.23 |
申请号 |
US20080252887 |
申请日期 |
2008.10.16 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
KEIL DOUGLAS L.;LI LUMIN;HUDSON ERIC A.;SADJADI REZA;LENZ ERIC H.;DHINDSA RAJINDER;KIM JI SOO |
分类号 |
H05H1/02;C23C16/00;H01J37/32 |
主分类号 |
H05H1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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