PURPOSE: A ceramic heat radiation plate and a manufacturing method thereof are provided to control a pore rate by controlling the amount of silicon carbide and inorganic bond. CONSTITUTION: Slurry is formed by dispersing silicon carbide agglomerate particles and inorganic binder agglomerate particles(S100). Uniform slurry is formed by attaching the inorganic binder on the surface of the silicon carbide agglomerate(S200). The uniform slurry is made of granule powder(S300). The granule powder is formed with a preset shape(S400). The formed body is thermally treated at 600 to 1200 degrees centigrade at 10°C/min and then is thermally treated at 1200 to 1600 degrees centigrade at 5°C/min(S500). The surface of the ceramic heat radiation plate is polished(S700).
