发明名称 PHOTOCURABLE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photocurable composition that can be easily handled, shows high self-repairing ability and yields a coating film excellent in processibility and resistance to warpage. SOLUTION: The self-repairing photocurable composition includes: (a) 100 pts.mass reactive polymer having a (meth)acryloyl group represented by formula (I) (wherein A is a diene polymer residue; R<SB>1</SB>is a residue obtained by removing an isocyanate group from an aliphatic, alicyclic or aromatic diisocyanate compound; R<SB>2</SB>s are each independently a 6-50C aromatic group, 2-20C aliphatic group or 6-50C alicyclic group; R<SB>3</SB>is a hydrogen atom or a methyl group; and n is a natural number of 1-10); and (b) 0.1-10 pts.mass photopolymerization initiator. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010260905(A) 申请公布日期 2010.11.18
申请号 JP20090110806 申请日期 2009.04.30
申请人 NIPPON PAINT CO LTD 发明人 HIDA TAKAHARU
分类号 C08F299/06;B05D7/24;C08F290/06;C09D4/00;C09D175/14 主分类号 C08F299/06
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