<p>The inventive chemical-mechanical polishing system comprises a polishing component, a liquid carrier, and a polyether amine. The inventive method comprises chemically-mechanically polishing a substrate with the aforementioned polishing system.</p>
申请公布号
EP2029689(A4)
申请公布日期
2010.11.17
申请号
EP20070755680
申请日期
2007.04.18
申请人
CABOT MICROELECTRONICS CORPORATION
发明人
DYSARD, JEFFREY;FEENEY, PAUL;ANJUR, SRIRAM;JOHNS, TIMOTHY;XIN, YUN-BIAO;WANG, LI
