发明名称 Method of fabricating thin film transistor
摘要 A method of fabricating a thin film transistor, in which source and drain electrodes are formed through a solution process, even all stages which include formation of electrodes on a substrate, formation of an insulator layer, and formation of an organic semiconductor layer are conducted through the solution process. In the method, the fabrication is simplified and a fabrication cost is reduced. It is possible to apply the organic thin film transistor to integrated circuits requiring high speed switching because of high charge mobility.
申请公布号 US7834352(B2) 申请公布日期 2010.11.16
申请号 US20080972847 申请日期 2008.01.11
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE TAE WOO;BYUN YOUNG HUN;LYU YI YEOL;LEE SANG YOON;KOO BON WON
分类号 H01L31/00 主分类号 H01L31/00
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