| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemically amplified photoresist composition or the like from which a pattern having an excellent shape, line edge roughness, and a focus margin can be formed. <P>SOLUTION: The chemically amplified photoresist composition contains an acid generator and a resin, wherein the resin contains a structural unit (b1-3) derived from a monomer that produces a carboxyl group and a hydroxyl group by an action of an acid, without lactone ring. <P>COPYRIGHT: (C)2011,JPO&INPIT |
