| 摘要 |
Disclosed are an exposure method and apparatus, a coating apparatus and a device manufacturing method, wherein, in one preferred form, the exposure method is used to expose a resist having been applied onto a substrate by one of a plurality of resist coating units, and it includes a selecting step for choosing an exposure amount pattern that represents exposure amounts corresponding to a plurality of shots on the substrate, respectively, on the basis of a resist coating unit data that specifies which unit among the plurality of resist coating units should be used to apply a resist onto the substrate, and an exposure step for exposing the resist on the substrate in accordance with the exposure amount pattern chosen by the selecting step.
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