发明名称 |
TEMPLATE, METHOD OF MANUFACTURING THE SAME, AND METHOD OF FORMING PATTERN |
摘要 |
PROBLEM TO BE SOLVED: To provide a template in which the gap region of a substrate to be processed can be covered with an imprint resist uniformly with good reproducibility, a method of manufacturing the same, and to provide a method of forming a pattern. SOLUTION: The method of manufacturing the template used in an optical imprint method includes: forming a pattern for imprinting in a pattern forming region 14 on a substrate 10; forming a resist film 11 in the pattern forming region 14; carrying out anisotropic etching using the resist film 11 as a mask to form a first step portion 13b and a first side portion 13a that connects the pattern forming region 14 and the first step portion 13b; forming a resist film 12 in the pattern forming region 14 and an outer peripheral portion 14b surrounding the pattern forming region 14 after removing the resist film 11; and carrying out wet etching using the resist film 12 as a mask to form a second step portion 13d and a curved second side portion 13c that connects the first step portion 13b and the second step portion 13d. COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2010251601(A) |
申请公布日期 |
2010.11.04 |
申请号 |
JP20090100937 |
申请日期 |
2009.04.17 |
申请人 |
TOSHIBA CORP |
发明人 |
YONEDA IKUO;KONO TAKUYA;NAKASUGI TETSUO;INENAMI RYOICHI |
分类号 |
H01L21/027;B29C33/38;B29C59/02 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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