发明名称 Method for filling a contact hole and integrated circuit arrangement with contact hole
摘要 A method in which a base layer is deposited in a contact hole region under a protective gas, where base layer contains a nitride as main constituent. After the deposition of the base layer, a covering layer is deposited under gaseous nitrogen. An adhesion promoting layer results which is simple to produce and has good electrical properties.
申请公布号 US7825510(B2) 申请公布日期 2010.11.02
申请号 US20080032267 申请日期 2008.02.15
申请人 INFINEON TECHNOLOGIES AG 发明人 FOERSTER JUERGEN;PRUEGL KLEMENS;SCHUDERER BERTHOLD
分类号 H01L23/34;H01L21/28;H01L21/285;H01L21/768 主分类号 H01L23/34
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